High-precision quartz wafers for semiconductors, optics, and laboratories-Mia

As core products of high-purity quartz glass, quartz wafers, with their extremely low thermal expansion coefficient, excellent ultraviolet light transmittance and strong chemical corrosion resistance, are indispensable basic precision materials in semiconductor lithography, optical detection, laboratory spectral analysis, and laser equipment fields. Recently, the domestic quartz processing industry has continuously iterated polishing, chamfering, and coating processes, and high-precision quartz wafer products have accelerated their entry into the global export market. The domesticization and overseas expansion of quartz materials have been accelerating simultaneously.

Quartz wafers are made from high-purity fused quartz (SiO₂) and are processed through multiple precise procedures such as cutting, grinding, polishing, and cleaning. The products can be customized according to customer requirements for thickness, tolerance, and surface flatness, and are classified into categories such as JGS1 ultraviolet quartz wafers and JGS2 infrared quartz wafers, etc. They support secondary processing such as AR anti-reflection coating and chamfering, and are widely used in scenarios such as semiconductor equipment observation windows, spectrometer color bases, laser protection lenses, and photocatalytic reaction chamber covers. Unlike ordinary glass, high-purity quartz wafers can withstand temperatures up to 1100°C, are not easily eroded in strong acid and strong alkali environments, have outstanding ultraviolet band light transmittance performance, and are the preferred substrates for high-end scientific research and industrial applications.

The global demand for optical equipment related to semiconductor and AI computing power continues to rise, driving a steady growth in the demand for high-precision quartz wafers.